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Journal of Engineering and Applied Science

Table 3 Average concentrations of species at the substrates and at the plane of the filaments

From: Numerical calculation of temperature, velocity, and species concentration distributions in a hot filament chemical vapor deposition in a reactor using a CH4/H2 mixture

Molecule/radical

Average concentration Ck,av (m−3) for n = 4

Substrates

z = 0, z = Zmax

Plane filaments

z = Zmax/2

H2

4.74×1023

4.10×1023

CH4

6.70×1021

7.94×1021

C2H6

9.89×1018

9.88×1018

C2H4

5.25×1016

1.50×1017

C2H5

32.89×1015

94.85×1015

CH3

5.16×1015

4.29×1015

H

1.28×1015

1.64×1015

C2H3

128.02×106

947.61×106

C2H2

0.0081

0.013

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