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Table 1 Values of parameters used for the reactor

From: Numerical calculation of temperature, velocity, and species concentration distributions in a hot filament chemical vapor deposition in a reactor using a CH4/H2 mixture

Parameter

Typical values

Filament temperature (K)

2100

Substrate temperature (K)

1173

Initial temperature of gas (K)

300

Pressure (Pa)

1000

Inlet velocity (mm s−1)

10

Length of the reactor in the x direction (mm)

240

Distance between substrates (mm)

20

Distance between three filaments (mm)

50

Distance between four filaments (mm)

33.3

Inlet gas composition CH4/H2

05–95%